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Subject: Re: [office] Two JIRA Issues for discussion

On 19 February 2010 17:27,  <robert_weir@us.ibm.com> wrote:

> I'm reading Murta-san's request as asking that we use a RNG schema for W3C
> digital signatures if one is available.

> My guess is that Murata-san and others would prefer that we used NVDL.

Why not ask him instead of guessing Rob?

> What might be interesting is whether we could get the ODF validators --
> the ODF Tool Kit union, the Office-o-tron and the OfficeShots one, to
> start validating all of their documents twice -- once with the existing
> schema and once with the re-factored schema.  They can then highlight
> whenever these two schemas differed in their results.  I think that would
> give us high confidence if they gave identical results over several
> months.

And how would you place 'blame' on any difference?
  Schema capability?
  Schema definition?
  Instance content/markup?


Dave Pawson
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