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Subject: Re: [office] Two JIRA Issues for discussion

On 19 February 2010 19:26,  <robert_weir@us.ibm.com> wrote:
> Dave Pawson <dave.pawson@gmail.com> wrote on 02/19/2010 01:04:13 PM:
>> > I'm reading Murta-san's request as asking that we use a RNG schema for
> W3C
>> > digital signatures if one is available.
>> > My guess is that Murata-san and others would prefer that we used NVDL.
>> Why not ask him instead of guessing Rob?
> We solicit public feedback via issuing public review drafts.  If TC
> members have a view on this issue they can weigh in on this list.  If
> Murata-san wishes to express his views more directly, he is welcome to
> join the TC.  If you wish that his views be expressed directly in the TC,
> unfiltered through my guessing, then you are also welcome to suggest that
> he join.

Well stop guessing then.

>> > What might be interesting is whether we could get the ODF validators
> --
>> > the ODF Tool Kit union, the Office-o-tron and the OfficeShots one, to
>> > start validating all of their documents twice -- once with the
> existing
>> > schema and once with the re-factored schema.  They can then highlight
>> > whenever these two schemas differed in their results.  I think that
> would
>> > give us high confidence if they gave identical results over several
>> > months.
>> And how would you place 'blame' on any difference?
>>   Schema capability?
>>   Schema definition?
>>   Instance content/markup?
> I don't think you can determine that a priori.

Nor (readily) at the time.
Not a good idea IMHO


Dave Pawson
Docbook FAQ.

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